Скачать или смотреть Huawei Just Tested a 3nm Chip Using Its Own EUV…… ASML in Trouble?

In a confidential facility in Dongguan, China, Huawei has successfully tested its own extreme ultraviolet lithography system, a technology previously monopolized by a single foreign supplier. The development follows years of U.S. sanctions that cut Huawei off from advanced semiconductor manufacturing tools and blocked China’s access to EUV machines, forcing the company and the broader Chinese semiconductor sector to pursue domestic alternatives. Using a different technical approach based on laser-induced discharge plasma, Huawei’s system is designed to generate the same 13.5-nanometer wavelength required for advanced chipmaking and has reportedly been used to test 3-nanometer chip production.
The EUV system remains in a testing phase, with trial production planned for later in 2025 and mass production targeted for 2026, while challenges related to yield rates and manufacturing scale persist. Alongside Huawei, SMIC, Chinese research institutes, and universities have reported parallel advances in lithography, optics, and alternative computing architectures, including analog chips based on resistive memory. These developments indicate a coordinated national effort to reduce dependence on foreign technology, potentially reshaping global semiconductor competition, energy efficiency in computing, and long-term technology strategies.

https://www.reuters.com/world/china/h...

https://www.scmp.com/tech/tech-war/ar...

https://www.ft.com/content/7c5a9c3a-1...

https://www.nature.com/articles/s4192...

https://www.reuters.com/technology/nv...

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