Скачать или смотреть Webinar: 300 mm Semiconductor Analytics XPS HAXPES Scanning Microprobe | Fraunhofer IPMS

X-ray photoelectron spectroscopy (XPS) is a surface sensitive and quantitative technique that probes the chemistry of a material. When the XPS X-ray source impinges a sample, electrons are excited by the photoelectric effect. The energies of the photoelectrons ejected are analyzed to obtain information on chemical state and elemental composition of a sample. With XPS, sample types such as wafers, foils, powders, etc. can be analyzed, in both conductive and insulating form. The technique can be applied to the analysis of oxides, doped materials, catalysts, electrode materials, organics and inorganics, alloys, single and multi-layer thin films, etc. We offer a unique lab-based combination of monochromatic x-ray sources: a soft x-ray source (Aluminium Kα) and a high energy X-ray source (HAXPES using Chromium Kα) for a wider range of analysis needs. In addition, several capabilities such as in-situ temperature measurements, depth profiling, micro-area analysis, and X-ray imaging (for structured or inhomogeneous samples) are possible. In this 20 minute webinar, the basics of XPS and capabilities of our new XPS/HAXPES instrument will be introduced.

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