Intel Adds ASML’s First High NA EUV Tool to Oregon Factory

ASML’s High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography scanner sits in Intel Oregon’s D1X test manufacturing factory, where it is going through its final calibration. It is as big as a double-decker bus and weighs as much as a blue whale. It will shoot lasers at light speed and heat plasma to nearly 220,000 degrees Celsius, almost 40 times hotter than the surface temperature of the sun. The new TWINSCAN EXE: 5000 has the ability to dramatically improve resolution feature scaling for next-generation processors and will enable the continued pursuit of Moore’s Law.

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