Скачать или смотреть Charles R. Szmanda presentation: The New U.S. Patent Law: What You Need to Know...

Presented at SPIE Advanced Lithography 2013 - http://spie.org/al

In "The New U.S. Patent Law: What You Need to Know and How It Will Affect Your Strategy," Charles Szmanda describes the most important aspects of the new patent law. These include: (1) the "first inventor to file" system, which takes effect on March 16, 2013 and replaces the "first to invent" system in current law; (2) new ways to challenge issued patents such as "Post Grant Review" and "Inter Partes" review; (3) prior art submission during prosecution of another inventor's patent application; (4) prioritized examination of applications; and (5) prior user rights. He also discusses how these new elements of the law will alter the competitive environment but will also present a number of opportunities for formulating a successful patent strategy within that new environment.

Charles R. Szmanda is a principal partner at the Patent Practice of Szmanda & Shelnut, LLC. During his career, Szamanda designed processes for making silicon devices at Bell Labs, did polymer research for micro and nanolithography, helped found a startup company, Aspect Systems, did fundamental research on electron transfer during molecular collisions, practiced the wonderful art of x-ray crystallography and generally had a lot of fun. He holds 31 U.S. patents and is the author of over 60 scientific publications.