Скачать или смотреть Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methano... | RTCL.TV

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#silicondioxide #studyexamined #methanolchemistry #isotropicetching #silicon #dioxideselective #dioxide #RTCLTV #shorts

Article Attribution ###
Title: Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor
Authors: Hong Seong Gil, Doo San Kim, Yun Jong Jang, Dea Whan Kim, Hea In Kwon, Gyoung Chan Kim, Dong Woo Kim ,and Geun Young Yeom
Publisher: Nature Portfolio
DOI: 10.1038/s41598-023-38359-4
DOAJ URL: https://doaj.org/article/4fabe9f2b852...
Source URL: https://doi.org/10.1038/s41598-023-38...



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