double PCB developing washing machine ，Sodium carbonate development

double PCB developing washing machine ，Sodium carbonate development

Features: solder mask /photoresit developing Machine is used for PCB photoresist film developer work. auto spray imaging Machine.PCB Developing MACHINE, Small film Developing Machine, auto spray imaging Machine
http://www.etchmachinery.com
Countact Us
Attn: Ms.Karen
E-mail: [email protected]
Skype ID:lypretty1
Cell/Whatsapp/Wechat:+86-150 1060 8128
Fax: +86-10 6756 9148
ADD:Room701,B-Building,Greenland
Group,Xinghua Street,Daxing Disctrict,Beijing,China

Process flow: Load → developing → →washing →Unload

Main technical parameter:

Model:GE-SRD650
Power: 3KW/380V
Working size: 400*L mm(L= length is not limited)
working height:720±10mm;
developing area length: 500mm
Washing area lenght:200mm
Working Temp.: 38~65℃
Tolerance: 0.05mm
Etching type: PLT sprayer
Transfer type: PLT wheel
Outsize:1250*1100*1200mm (mm)
weight: 300kgs
Control System:
Speed Adjust system
Pressure Adjust System
Temperature control System(both Heater and cooler)
Network Filter System
High temperature (up to 100) resist PP material
Long time Etching Ability

This machine with high precision oscilation system 。

solder mask developing Machine,PCB Developing MACHINE,film Developing Machine,auto spray imaging Machine