Using Remote Plasma Source in Semiconductor Manufacturing

This video showcases the key steps in wafer manufacturing, with a focus on the photoresist strip process. It highlights the need for an effective Remote Plasma Source (RPS) to remove unwanted layers from the wafer surface and maintain high throughput while reducing contamination and avoiding damage to fragile materials and structures.

The video explains how MKS' RPS technology uses an anodized-aluminum vessel to improve hydrogen plasma containment and ensure consistent radical delivery. The RPS provides a wide range of process flow rates and pressure, operates with multiple chemistries, and uses lower metals for on-wafer processes. It is suitable for semiconductor, flat-panel display, solar, and electronic thin film applications.

Explore MKS Instruments' https://www.mks.com/c/remote-rf-plasm...

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About MKS Instruments
MKS Instruments is a global provider of instruments, systems, subsystems, and process control solutions that measure, monitor, deliver, analyze, power, and control critical parameters of advanced manufacturing processes to improve process performance and productivity for our customers. Additional information can be found at www.mksinst.com.

MKS Instruments, Inc.
2 Tech Drive, Suite 201
Andover, Massachusetts 01810
USA

Tel: 978-645-5500
Fax: 978-557-5100
[email protected]
www.mksinst.com